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showing 1 - 12 of 12
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Intergrated Measurement Systems Inc. Three Scan Speeds
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Intergrated Measurement Systems Inc. Three Scan Speeds
Scan Length: 50 Microns to 30MM, Tracking Force: 10 to 50MG.
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Inquire
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KLA Tencor SurfScan 4500
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KLA Tencor Surfscan 4500 Surface Particle Inspection Analyzer
Laser -based system that scans the entire substrate surface, producing
color coded graphic displays and hardcopy printouts of particles
locations.
Sub micron particles, down to 0.2um are readily detected.
Measurement time : 30 sec on 6" wafers
Particles Sensitivity : 0.2um diameter latex spheres.
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Inquire
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KLA-Tencor OmniMap RS100 Resistivity Mapping System
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KLA-Tencor's OmniMap RS-100 - System capable of running 200mm and 300mm wafers. RS-100 has the ability to measure maeterials such as polysilicon, copper and bulk silicon substrates.
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Inquire
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KLA-Tencor UV-1050
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KLA-Tencor UV1050 Film Thickness Measurement System Thin film measurement tool with broadband UV optics and dual , Configurable for Multiple Wafer Sizes up to 200mm.
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Inquire
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Prometrix RS35C Resistivity Mapping System, Cassette to Cassette Load 4 Point Probe4"- 8" Capable
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Manual Load 4 Point Prober The OmniMap collects and analyzes sheet resistance data on various conductive layers such as implants, diffusions, epi, CVD, metals and bulk substrates. Charts Wafer size 4" - 8".
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Inquire
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Prometrix RS55 TC Resistivity Mapping SystemWafer size 2" - 8" Manual Load
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OmniMap® Four Point Probe Resistivity Mapping System For sheet resistance process control.System includes TC option (Temperature Compensation Hardware)Prometrix RS55 TC Resistivity Mapping System With Type B Probe Head (Table Top Unit)System includes TC option (Temperature Compensation Hardware) Omni Map Four Point Probe Resistivity Mapping System For sheet resistance process control.
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Inquire
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Rudolph Auto EL III Ellipsometer (Maximum wafer size 150mm)
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Ellipsometer. Internal data reduction software for single and double layer transparent films. 633 nm wavelength. 6 in. dia. quickload stage. Built in printer. Measuring time 17 to 50 secs Rudolph Auto EL III Ellipsometer Ellipsometer. Internal data reduction software for single and double layer transparent films. 633 nm wavelength. 6 in. dia. quickload stage. Built in printer. Measuring time 17 to 50 secs Sample stage: movement X/YSECS II InterfaceInternal data reduction software Built in Printer
ASSET#4412
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Inquire
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Rudolph Auto EL IV Ellipsometer w/ Automatic R-06 Stage
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Multi-Wavelength uses light at 3 different wavelengths Automatic R-06" sample stage: movement can be pre-programmed or controlled via joystick Rudolph Auto EL IV Ellipsometer. Maximum Wafer Size 150mm,
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Inquire
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Rudolph Auto EL IV Ellipsometer w/ Automatic R-06 StageMaximum wafer size 150mm
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Multi-Wavelength uses light at 3 different wavelengths Automatic R-06" sample stage: movement can be pre-programmed or controlled via joystick Rudolph Auto EL IV EllipsometerMulti-Wavelength uses light at 3 different wavelengthsTungsten Halogen LaserIncludes Micro-spotWavelength 633, 576, 405nmAutomatic R-06" sample stage: movement can be pre-programmed or controlled via joystickSECS II InterfaceInternal data reduction softwareBuilt in Printer
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Inquire
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Rudolph Research FE-III Focus Duel Wavelength Ellipsometer
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Rudolph Research FE-III Focus Ellipsometer
Fully automated high speed focused beam ellipsometer for simultaneous multi-angle measurements. 4" to 8" capable wafers.
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Inquire
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Rudolph Research FE-IIID Focus Duel Wavelength Ellipsometer
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Rudolph Research FE-III Focus Ellipsometer
Fully automated high speed focused beam ellipsometer for simultaneous multi-angle measurements.
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Inquire
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ThermaWave Opti-probe 1600
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Therma-Wave Opti-Probe 1600, Film Measurement System for Multilayer Thick or Thin Films. System includes patern recognition. System can measure a film's reflectivity. Spatial averaging and and spectrometer regions displayed. Contour and 3D maps for all template measurements.Thick/Thin film calculations for non-absorbing films. 100/120V, 50/60Hz
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Inquire
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showing 1 - 12 of 12
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