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showing 1 - 25 of 40
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Dektak IIA (Sloan)
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Surface Profile Measuring System, Capability up to 6".
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Inquire
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InspecTech KIS 2000 Dicing Yield Maximizer
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automatic system for inspecting diced semiconductor wafers up to 200 mm in diameter (with a 300 mm option).
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Inquire
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KLA / Tencor P20H Long Scan Profiler
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Long Scan Profiler
Measurement of vertical features ranging from 100A to 0.3mm
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Inquire
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KLA 2131 Defect Inspection System
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High Speed Multilayer Wafer Inspection For Process Defects Inspection Modes for Arrayed and Random Patterns- 4" to 8" Water Capability
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Inquire
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KLA 2131 Defect Inspection System Upgraded to 2132
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High Speed Multilayer Wafer Inspection For Process Defects Inspection Modes for Arrayed and Random Patterns- 4" to 8" Water Capability
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Inquire
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KLA 2606 Defect Review Station
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Review Station with Nikon BD Plan 10/20/60/100 Objectives
4" to 6" Water Capability
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Inquire
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KLA 2606 Defect Review Station (2)
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Review Station with Nikon BD Plan 10/20/60/100 Objectives
4" to 6" Water Capability
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Inquire
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KLA Tencor 6200
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Capable of handling 4", 5", 6" and 8" wafer submicron sensitivity, detects 0.10 micron particles.
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Inquire
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KLA Tencor 6200
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Non-Patterned Wafer Surface Inspection System.
Throughput 150 per hour of 200mm
Wafer Size 100,125,150,200 mm
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Inquire
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KLA Tencor 7600M
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KLA / Tencor 7600 Surfscan Patterned / Unpatterned Wafer Inspection System Can detect defects as small as 0.15 m Can measure defects on unpatterned wafers and measuring wafers from 4" to 8"
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Inquire
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KLA Tencor 7700(M) (2)
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KLA / Tencor 7700 Surfscan Patterned / Unpatterned Wafer Inspection System, Can detect defects as small as 0.15 m, Can measure defects on unpatterned wafers and measuring wafers from 4" to 8"
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Inquire
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KLA Tencor AIT I (In-Line Defect Inspection System)
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Automated full water inspection system for detecting particles as small as 0.10 micrometers on bare silicon and patterned process wafers. High throughput of up to 30 full wafer scans per hour on 150 mm wafers.
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Inquire
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KLA Tencor AIT I - Model:8020
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KLA Tencor AIT 706copper , Model:8020 , Automated full wafer inspection system for detecting particles as small as 0.10 micrometers on bare silicon and patterned process wafers
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Inquire
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KLA Tencor P20H Long Scan Profiler
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Long Scan Profiler
Measurement of vertical features ranging from 100A to 0.3mm
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Inquire
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KLA Tencor SurfScan 4500
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KLA Tencor Surfscan 4500 Surface Particle Inspection Analyzer
Laser -based system that scans the entire substrate surface, producing
color coded graphic displays and hardcopy printouts of particles
locations.
Sub micron particles, down to 0.2um are readily detected.
Measurement time : 30 sec on 6" wafers
Particles Sensitivity : 0.2um diameter latex spheres.
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Inquire
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KLA Tencor Surfscan 7600(M)
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Can measure defects on unpatterned wafers and measuring wafers from 4" to 8" KLA / Tencor 7600 Surfscan Patterned / Unpatterned Wafer Inspection System. W/Microscope
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Inquire
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KLA- Tencor P2 Long Scan Profilometer
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High sensitivity surface profiler measuring roughness, waviness and step height. Sample Size: up to 200 mm
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Inquire
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KLA-Tencor 2020
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KLA Tencor 2020 - Cassette to Cassette Wafer Handling.
Macro Inspection on Multi-Layer Wafers.
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Inquire
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KLA-Tencor 6200 Surfscan
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Non-Patterned Wafer Surface Inspection System.
Throughput 150 per hour of 200mm
Wafer Size 100,125,150,200 mm
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Inquire
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KLA-Tencor 6200 Surfscan - Wafer Surface Contamination Analyzer
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Capable of handling 4", 5", 6" and 8" wafer submicron sensitivity, detects 0.10 micron particles.
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Inquire
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KLA-Tencor 6200 Surfscan - Wafer Surface Contamination Analyzer
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Capable of handling 4", 5", 6" and 8" wafer submicron sensitivity, detects 0.10 micron particles.
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Inquire
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KLA-Tencor 6220 Surfscan Wafer Surface Inspection System
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Non-Patterned Wafer Surface Inspection System.
Throughput 150 per hour of 200mm
Wafer Size 100,125,150,200 mm (4" to 8" Water Capability)
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Inquire
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KLA-Tencor 6220 Surfscan Wafer Surface Inspection System
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Non-Patterned Wafer Surface Inspection System.
Throughput 150 per hour of 200mm
Wafer Size 100,125,150,200 mm (4" to 8" Water Capability)
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Inquire
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KLA-Tencor 6420 Surfscan Unpatterned Surface Inspection System
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Non-patterned wafer film surface analyzer
Wafer Size 100,125,150,200 mm round or rectangular substrates
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Inquire
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KLA-Tencor Flexius FLX 2300
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Thin Film Stress Measurement System, Dual Wave Length and Heated Chuck, Ambient to 500c
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Inquire
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showing 1 - 25 of 40
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