System used for step heights, etch depths, coating thickness, micro roughness and a variety of precision surface characteristics. Handles 3" to 8" wafers.

These steppers are ideal for high-volume manufacturing, where low capital and operating costs combine with increased throughput for high productivity. It is capable of working with 2" to 8" wafers, and exposes reticule images in a step-and-repeat manner.

These steppers are ideal for high-volume manufacturing, where low capital and operating costs combine with increased throughput for high productivity. It is capable of working with 2" to 8" wafers, and exposes reticule images in a step-and-repeat manner.