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showing 1 - 15 of 15
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Cleanroom Air Handler - Pennbarry (2 Availible)
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Cleanroom Air Handler - Pennbarry (2 Availible)
Model: D36 - Fan RPM - 901
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Inquire
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Evergreen SSEC 50XP Cleaner
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The Single-Sided Cleaner is a Fully Automatic Machine designed to scrub, rinse and spin dry carriers. The carriers are loaded manually onto the vacuum fixture. PC-controlled tool can store multiple programs with multiple events.
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Inquire
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Evergreen SSEC M10 Cleaner
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The Single-Sided Cleaner is a Fully Automatic Machine designed to scrub, rinse and spin dry carriers. The carriers are loaded manually onto the vacuum fixture. PC-controlled tool can store multiple programs with multiple events.
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Inquire
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Fluoroware HTC 4000 Cassette/Box Washer
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Stainless Steel Dual Action Peripheral Cleaning System, Overall inside process area Dimensions 20" x 20" x 18", Capable of 2" to 8" wafer cassette and cassette holders
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Inquire
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S&K Vapor Dryer MegaSonic System
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S & K Vapor Dryer MegaSonic System
Capable of 8" wafers
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Inquire
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Semitool S-260 Single Stack SRD
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Semitool S-260 Single Stack SRD, Capability of 2" to 5" Wafers, PC 101 digital controller, Resisitivity monitors, Static eliminators.
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Inquire
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SemiTool ST-270
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Semitool Single "Table Top" Spin Rinser Dryer capable of processing up to 6" wafers. Possible options include: rotors, static eliminator, resistivity monitor and water recirculator.
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Inquire
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Semitool ST-860 Double Stack SRD
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Spin Rinser Dryer - Doulde Stack Unit - Capable of 2" to 5" Wafers - PCM 228 Controller - TC-30 Resistivity Monitors
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Inquire
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Semitool Storm 3 Cassette Cleaner
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The Storm III, an economy cleaner, is designed to clean cassette box or carrier sizes, up to 200mm
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Inquire
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Semitool Storm 3 Cassette Cleaner (2)
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The Storm III, an economy cleaner, is designed to clean cassette box or carrier sizes, up to 200mm
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Inquire
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Semitool WST 306 Wafer Soluble Develop/Strip Tool
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Water Soluble Solvent Tool (WST) is designed for sray delivery of non-phenolic, water soluble chemical across wafer or substrate surface. Capability of 100mm - 125mm wafers.
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Inquire
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Ultra T Cleaner Model: SWC111M
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HP CLEANER, This cleaning system removes all types of particle from a variety of substrates (wafer, photo masks, FPD, optical disks, etc¿). This very reliable and cost effective system utilizes a proven high-pressure de-ionized water spray. (1) PLC FESTO
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Inquire
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Ultra T Cleaner Model: SWC111M(2)
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HP CLEANER, This cleaning system removes all types of particle from a variety of substrates (wafer, photo masks, FPD, optical disks, etc¿). This very reliable and cost effective system utilizes a proven high-pressure de-ionized water spray. (1) PLC FESTO
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Inquire
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Verteq 1600-2 SRD Single Stack
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Low Particulate Rinser/Dryer
Capable of 4" to 6" Wafers
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Inquire
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Verteq 1800-6AR
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The DI water is sprayed into the bowl through eight nozzles as the rotor turns at the speed selected, and the dry cycle consists of filtered nitrogen entering the bowl through the door blow off nozzle, static eliminator manifold and the bowl nozzles.1 NS
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Inquire
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showing 1 - 15 of 15
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