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showing 1 - 4 of 4
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Ultra T Cleaner Model: SWC111M
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HP CLEANER, This cleaning system removes all types of particle from a variety of substrates (wafer, photo masks, FPD, optical disks, etc¿). This very reliable and cost effective system utilizes a proven high-pressure de-ionized water spray. (1) PLC FESTO
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Inquire
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Ultra T Cleaner Model: SWC111M(2)
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HP CLEANER, This cleaning system removes all types of particle from a variety of substrates (wafer, photo masks, FPD, optical disks, etc¿). This very reliable and cost effective system utilizes a proven high-pressure de-ionized water spray. (1) PLC FESTO
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Inquire
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Verteq 1600-2 SRD Single Stack
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Low Particulate Rinser/Dryer
Capable of 4" to 6" Wafers
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Inquire
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Verteq 1800-6AR
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The DI water is sprayed into the bowl through eight nozzles as the rotor turns at the speed selected, and the dry cycle consists of filtered nitrogen entering the bowl through the door blow off nozzle, static eliminator manifold and the bowl nozzles.1 NS
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Inquire
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showing 1 - 4 of 4
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