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Rapid Thermal Processor System,
Single Wafer Processing Capability up to 8" Rapid Thermal Processor System,
Single Wafer Processing Capability up to 8" Standard End Effectors,
2Cassette station Swivel,
Yapper Cassette Station Type Banner Cooling Station Wafer Aligner Equipped 105 Robot with 100 Controller Temperature Control,
DCP Pyrometer ATP #1 and #2
Version 2.03 Software/Firmware Read Controller capability System to includes a 6-Gas Panel Precise Temperature / Time Control and Multiple Cycle Processing
Full SECS II Capability Steady State Temperature Range 400 to 1200c
Steady State Process Time Programmable: 0-600 Sec Ramp-up Rate Programmable: 10c/sec - 25c
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408-654-9500
