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The Karl Suss MA56 Mask Aligner Exposure System Features/Specifications:

• System is capable of 3" - 5" wafers / cassette to cassette
• 350 W lamp housing
• UV-400 exposure optics
• 365-405nm wavelength
• Max substrate size: 4" x 4"
• KSM Split-field microscope
• Objective distance - adjustable from 24-100mm
• Motorized XYZ stage
• 208V / 1 phase / 20amp
• 5 bar (80psi) CHA
• 2 bar (35psi) N2
• .7 bar minimum
• Calibrated system to Suss specifications
• Some of the remanufactured features by SPEC:
• Anodized aluminum parts
• Rebuilt all system subassemblies
• Replaced bearings and cylinders
• Replaced pneumatic hoses
• Recoated ellispoidal mirror
• Replaced all panel lamps
• Replaced UV lamp
• Painted entire system frame, base plate, and covers

For more information on this tool or the series, click here.