Auto Loadlock and pallet Control Three Gas Capability RF and DC Sputter Deposition Capability Capability of Round Targets Perkin Elmer 4400 Sputtering SystemThree Target System System includes the following:Main Processing System with Load Lock Large Substrate Pallet Digital Granville Phillips Ion Gauge with TC GaugeAuto Pumpdown ControlAuto Loadlockand pallet Control MKS Gas Control SystemThree Gas Capability MKS Pressure ControlCTI Cryo pump w/ compressor RF and DC Sputter Deposition CapabilityCapability of Round TargetsHeated Load Lock208v / 3 phase /60Hz
408-654-9500
