Removes organic material using O2 radical. Contains microwave power supplyUlvac UNA-2000 Ashing SystemRemoves organic material using O2 radical.Contains microwave power supplyWafer hoist mechanismDigital set-point controls, and transfer chamberO2:5000SCCM. N2/H2: 300 SCCM. Temperature 220C; PMT Voltage 700V to 800V.
408-654-9500
