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A low cost, low volume, plasma cleaning system with sequencer control. It comes with a capacitive downstream reactor and a multi-program microprocessor controller. 

Yield Engineering YES R-3 Plasma Cleaning System Features/Specifications:

• Parallel plate designCan be used in Active
• Electron-free or RIE mode
• Total plasma uniformity across planar shelves.
• Two gas inputs
• Chamber size: 16" W x 12" D x 7" H