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Ultratech UltraStep 1500 Big Field Projection Stepper
Capability 2" to 8" wafers
Exposes reticule images in a step-and-repeat manner
Fine line resolution (0.1um standard, .8um optional) and tight overlay accuracy
Features include: a large exposure field, permitting large die exposure
Electronic focus system for more accurate and repeatable substrate positioning in focal plane
XY Stage, air bearing, laser metered, resolution of .00004mm
PC controlled HP9122c computer
Throughput : 55 WPH (1.0um lens), 45 WPH (0.8um lens)
Auto Pre alignment
Cassette to Cassette Load
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408-654-9500
