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An OmniMap system with the ability to measure materials such as polysilicon, copper, and bulk silicon substrates.

The KLA-Tencor OmniMap RS-100 Resistivity Mapping System Features/Specifications:

• System capable of running 200mm and 300mm wafers
• Applications range from metal depostion, CMP, ion implantation, and diffusion
• High-resolution such as 49,100 or 625 point maps
• Modular handler flexibility choose from a variety of automated handler configurations:
• Open cassette for 200mm to 300mm wafers,
• FOUPs 300mm or
• SMIF 200mm
• Measurement Range:  5m/sq - 5M/sq
• Repeatability: (VLSI) < 0.2% (1o)
• Accuracy: (VLSII) ±1%
• Edge Exclusion: 1mm from edge of film
• Temperature Accuracy: ±0.5C
• Temperature Repeatability: ±0.2C
• Throughput (5-site): 85WPH
• Alignment System: Camera
• Factory Automation: SECS/GEM, HSMS, E40/E94/E90, E84, E87,
• Computer OS : Windows NT
• Computer Configuration: P3 733MHz; 256MB RAM; 18GB HDD