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System capable of running 200mm and 300mm wafers, Application range from metal depostion, CMP, ion implatation, and diffusion, RS-100 has the ability to measure maeterials such as polysilicon, copper and bulk silicon substrates, High-resolution such as 49,100 or 625 point maps,
Modular handler flexibility choose from a variety of automated handler configurations: Open cassette for 200mm to 300mm wafers, FOUPs 300mm or SMIF 200mm, Measurement Range: 5m/sq - 5M/sq, Repeatability: (VLSI) < 0.2% (1o), Accuracy: (VLSII) ±1%, Edge Exclusion: 1mm from edge of film, Temperature Accuracy: ±0.5C, Temperature Repeatability: ±0.2C, Throughput (5-site): 85WPH, Alignment System: Camera, Factory Automation: SECS/GEM, HSMS, E40/E94/E90, E84, E87,
Computer OS : Windows NT
Computer Configuration: P3 733MHz
256MB RAM
18GB HDD
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408-654-9500
