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The Rudolph FE-III Focus Ellipsometer is a fully automated, high speed, focused beam ellipsometer designed for the semiconductor production environment. It handles 4" to 8" wafers. This tool has a fully automated site by site sample alignment and automatic feature recognition.

Rudolph Research FE-III Focus Ellipsometer Features/Specifications:

• 4 - 8" wafer handling
• Small spot (12 x 24µm)
• Class 1 filtered wafer environment
• Advanced measurement capability
• Simultaneous "multi-angle" of incidence measurements
• No order ambiguity for transparent films.
• Increased parameter solving
• A single measurement is performed within 1/10th of a second.
• System intensity is automatically controlled to compensate for the varying intensity of different samples.
• Advanced measurement capabilities:
  • Silicon dioxide: 0 - 5 microns
  • Silicon nitride: 0 - 8000Å
  • PhotoResist: 0 - 3 microns
• Light source: 633nm HeNe laser, 780nm laser diode