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Capable of handling 4", 5", 6" and 8" wafer submicron sensitivity, detects 0.10 micron particles KLA-Tencor 6200 Surfscan Wafer Surface Contamination Analyzer Submicron sensitivity, detects 0.10 micron particles Instantaneous magnified 3-D views of individual defectsColor coded defect maps, histograms and other graphicsSurface haze detectionCapable of handling 4", 5", 6" and 8" wafer, customer to spec wafer sizeLaser type wavelength: ArIon 488 30mW Particle Sensitivity: 0.10um @95%Measurement Range: 0.09-9999um Haze Sensitivity Resolution 0.05ppm Repeatability: 0.5% @ 1Throughput 150mm wafer 150wph System detects sub micron particles on polysilicon, tungsten, epitaxial and polished silicon. - Sensitivity 0.10um @ 95% Capture RateRepeatability less than 1.0% at 1 of 0.204 diameter latex spheres on bare silicon.Contamination less than 0.005 particles /cm2 greater than 0.15um - Illumination Source 30mw Argon-Ion Laser, 488nm wavelength Haze Sensitivity 0.02ppm3
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408-654-9500
