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An oxygen planar etcher that may be used for surface activiation and/or photoresist descum. It has a raised chamber for wafer sizes 4", 5", and 6".
Technics PEIIB Planar Etch System Features/Specifications:
- Parallel plate 15" chamber
- Raised chamber for 4/5/6"
- Microprocessor controller
- 11" Electrode
- 500 Watt @ 30Khz
- Two gas System
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408-654-9500
