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showing 1 - 15 of 15
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Branson IPC 4000 Barrel Asher
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Barrel asher - wafer capability up to 8"
Chamber size: 10" W x 23"D
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Inquire
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GaSonics 7104
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The GaSonics 7104 tool is a batch plasma system. Processing is accomplished at low temperature, and is used for surface treatment, descum, and cleaning organic material such as photoresist from metal, silicon and other assemblies.
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Inquire
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GaSonics AE2001 Etch System
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The AE2001 is a single wafer downstream-isotropic etch system, designed to etch thin films such as polysilicon, silicon nitride, and CVD oxides.
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Inquire
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GaSonics Aura 1000 Photoresist Asher
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An automated single-wafer photoresist asher. It is designed as a flexible downstream plasma photoresist removal system for high-volume wafer fabrication.
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Inquire
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GaSonics Aura 2000LL Photoresist Asher
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A single wafer load locked system (cassette to cassette) designed for clean, damage free photoresist removal.
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Inquire
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GaSonics Aura 3010 Photoresist Asher
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A downstream photoresist removal system. A damage-free asher with closed loop temperature control. 5 - 8 inch (125mm-200mm) wafer capability.
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Inquire
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GaSonics Aura 3010 Photoresist Asher with SMIF
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A downstream photoresist removal system. A damage-free asher with closed loop temperature control. 5 - 8 inch (125mm-200mm) wafer capability. This tool comes with optional integrated SMIF by Asyst.
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Inquire
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GaSonics IPC Series 9104 Plasma Asher
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A plasma asher/etcher/stripper--part of the IPC series. The system includes a multistep / multirecipe capability.
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Inquire
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GaSonics L3500
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Inquire
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GaSonics L3500(2)
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Inquire
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GaSonics L3500(3)
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Inquire
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GaSonics L3510 Single Wafer Ashing System
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A downstream photoresist removal system designed for clean and damage-free removal of resist structures. Works with 75-200mm wafers.
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Inquire
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GaSonics PEP 3510A/A Dual Chamber
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The GaSonics PEP 3510A/A is a single wafer, versatile microwave downstream Ash/Clean system with a dual chamber for wafer processing. It supports both 150mm and 250mm wafers.
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Inquire
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March PX-1000 Batch RIE Asher/Etcher System
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This is a downstream RIE or isotropic plasma barrel asher/etcher system. It comes with the RF generator: Advanced Energy RFX-600 (AE RFX-600) and a refrigerated circulator: Remcor CFF-500.
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Inquire
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Matrix Model 105 Asher
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A high throughput, single wafer system that specializes in photoresist removal. It is capable of handling a variety of substrates ranging from 3" to 6".
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Inquire
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showing 1 - 15 of 15
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