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Category: Mask Aligner - Exposure Systems - UV

    showing 1 - 10 of 10  
Image Product Details Inquiry
Canon MPA 500 Projection Mask Aligner

Auto Feeder: Single, cassette to cassette, backside wafer handling
Wafer size: currently 5" (4" and 3" sizes available)

 
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Canon MPA 600FA Mirror Projection Aligner

This mirror projection aligner has a single auto feeder. It is cassette to cassette and also has backside wafer handling.
 
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Canon PLA 501F Parallel Light Mask Aligner
Parallel Light Mask Aligner Cassette to cassette mask aligner can be used manually or in auto mode. Mask aligner for 2"-5" wafers.
 
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Fusion 150 PC Photostabilization System
A photostabilization system with 4" to 6" wafer capability.
 
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Fusion 200 PCU Photostabilization System

A photostabilizer with a fully automated, stand-alone, system for unicassette processes. Allows wafer sizes: 100mm to 200mm.
 
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Karl Suss MA150 Mask Aligner
A production aligner platform that offers high overlay accuracy. It is capable of processing wafers up to 150mm.
 
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Karl Suss MA56 Mask Aligner Exposure System
The first generation of the MA series from Karl Suss (Suss MicroTec). It is for all contact and proximity processes. This system is capable of 3" to 5" wafers.
 
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Karl Suss MA6 Mask Aligner / Exposure System
Karl Suss MA6 Manual loading and unloading of wafers or substrates.  For wafers 2" up to 6" or substrates 3"x 3" up to 6"x 6"
 
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Karl Suss MA6 Mask Aligner / Exposure System
Karl Suss MA6 Manual loading and unloading of wafers or substrates.  For wafers 2" up to 6" or substrates 3"x 3" up to 6"x 6"
 
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Karl Suss MA6/BA6 with Backside Alignment (BSA)

Karl Suss MA6 Mask Aligner / Exposure System Unit with video backside alignment. This tool is for wafers 2" to 6" or substrates 3"x 3" up to 6" x 6".
 
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    showing 1 - 10 of 10  
 
 

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