Single Wafer
The GaSonics3510 is a versatile downstream photoresist removal system,
designed for clean damage-free removal of the most difficult resist structures.
Utilizing the production -proven L-series platform, the L3510 has a wide process
window due to its patented large diameter microwave plasma source. Programmable
heating and process controls contribute to the system's unparalleled process
flexibility.
Features
- Ehanced reliability, serviceability and performance
- 75-200mm wafer capabilities
- Proven platform
- Platen and lamp heating for process flexibility
- Progammable process parameters
- High throughput, excellent uniformity
- Reliable endpoint detection
- Small footprint, low cost of ownership
- System performance matching
- Optional SMIF Indexer, AGV and robotic cassette loading
- Stand-alone or flushmount installation
Product Specifications
| Process |
| Gas Flows |
O2=1000-4000 sccm;
N2/H2=100=1000 sccm; N2=100-500 sccm
|
| Pressure |
0.5->5.0 torr
|
| Platen Temperature |
100-300 deg. C
|
| µ-wave Power |
1- 1200 watt at 2.45 GHz
|
| Lamp Utilization |
0-100% (1000 watts)
|
| Throughput |
(1.2 µm. blanket softbaked resist ashed to end
point, except for descum <300 Å.) |
| |
Descum/S.T. |
45-60 WPH |
| Baked Photoresist |
45-60 WPH |
| Implanted & Damaged Photoresist |
25-55 WPH |
| Uniformity |
(i Sigma ashed to 50% of >1.2
µm) |
| |
Within a wafer |
2%-5% |
| |
Wafer to wafer (average) |
2%-4% |
| Ash Rate |
<200 Å- >3.5 µm./min |
| System Matching |
2%-5% (I sigma) |
| Mobile Ion Concentration |
IEI0/cmP2-IEII/cm2 |
| CV Shift |
<0.1 volt |
| Particle |
<0.2/cm2, size of 0.2
µm. |
| Reliability |
| MTBF |
>168
hr. (6 mo. after sign off), 300 hr goal (12 mo after sign-off) |
| MTBA |
> 36
hr. |
| MTTR |
< 3 hr. for 80% of all downs |
| MTTA |
<5 min. |
| UPTIME (SEMI E10-92 STD) |
89-95% (Equip. dependent uptime; must meet
specific support requirements) |
| General Information |
| Substrate size |
3-8 inch/ 75mm-200mm
|
| Footprint |
30" (762 mm) W x 38" (965mm) D x 58: (1473mm) H
|
| Electrical |
200-240 VAC, 3 Phase, 50/60 Hz. |
| |
WYE configuration, 40 Amp breaker
|
| Typical Process Gases |
O2,
N2,/H2,N2,--regulated 18-23 PSIG
|
How may we help you? Contact us today to
discuss your service needs or to request a price quote.
|
|
See our inventory of GaSonics equipment available for
purchase |
