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KLA 21XX Series
KLA UV Series
The KLA-Tencor 21xx is a wafer inspection system that incorporates advanced sensor and image processing technologies. The 21xx enables manufacturers to detect all types of yield-relevant defects on all process layers, with high capture rates, automatically and consistently.
The KLA-Tencor UV Series system is designed for challenging thin film measurement applications. Based on proprietary advanced reflective optics, the broadband UV technology provides measurements on a wide range of applications, including oxide on polysilicon, ultraviolet (UV) reflectivity, etch-to-clear, and simultaneous oxide and TiN thickness for CMP applications.
| SPEC Refurbishment Procedures |
| Laser Calibration, Stage Calibration |
| Microscope Objectives calibration |
| Verify Auto Loader/wafers handling |
| Clean X-channel, Chuck and Effector |
| Clean and lubricate X & Y stage |
| Lubricate docking balls |
| Clean and verify optics aligment |
| Refurbish Cassette Elevators and Re-Anodize Plates (Complete wafer handling/mechanical motion: operate without error) |
| Refurbish load Arm |
| Verify air and vacuum |
| Verify AC and DC power |
| EPO Test |
| Refurbish all switches or replace |
| Refurbish all wiring or replace |
| System calibrated to OEM specifications. System calibration: ensure system has calibrated to meet the original specifications. |
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See our inventory KLA-Tencor equipment for purchase |
