- Karl Suss MJB3 (2" TO 3" Wafer Size)
- Karl Suss MBJ4 (2” to 4" Wafer Size)
The Karl Suss MJB3 & 4 are high performance mask aligners for contact exposure processes. Resolution far into the submicron region. Wafer and substrates up to 4”. For research, Laboratories, small series and pilot production.
The Karl Suss MJB3 series has earned a worldwide reputation for precision, reliability and high performance. The Karl Suss MJB4 is the next manual mask aligner following the MJB3. It is the ideal, economical unit for laboratories and small series production. In its contact exposure modes, the equipment can achieve a resolution of 0.5 µm, a performance unsurpassed in any other comparable machine.
These machines are widely used for MEMS and optoelectronics applications. These unit are specially configured for handling non-standard substrates such as hybrids, high-frequency components or fragile III-V materials, such as GaAs or InP. The MJB series tool can be equipped with either a SUSS Singlefield or a Splitfield Microscope enabling fast and highly accurate alignment.
Features and Benefits
- High resolution manual mask aligner capable to print features of 0.5 µm.
- Wafer and substrate handling up to 4" (wafers), 4"x4" (substrates)
- Special substrate chucks for pieces, III-V materials, thick substrates, hybrids and HF components.
- High precision X, Y, Q alignment stage and microscope manipulator
- High intensity optical setups for different UV- exposure wavelengths up to 90mW/cm²
- Laser applications on request
- Easy access assembly to all parts of the mask aligner
SPEC follows all Karl Suss refurbishment procedures and uses experienced and qualified Karl Suss vendors.
How may we help you? Contact us today to discuss your service needs or to request a price quote. |
|
See
our Karl Suss equipment available for purchase
See
all of our photolithography equipment available for purchase
|
